CRYSCORE OPTOELECTRONIC LIMITED

STANDARD SAPPHIRE WAFERS (C-PLANE)(2022年)

cryscore — 2022-10-28T18:12:38+0900

https://www.cryscore.com/products/standard-sapphire-wafers/

CRYSCORE can offer Epi-Ready grade sapphire wafer with a very low surface roughness in complete orientation options.

C plane sapphire wafers are being extensively used for epitaxial growth of III-V and II-VI compounds, such as gallium nitride (GaN), aluminum nitride (AlN), for bright blue and green LED and laser diodes.

Different Sizes of Standard Sapphire Wafers
1 Inch C-plane(0001) Sapphire Wafers
After over 12 years extensive experience, CRYSCORE can produce high quality sapphire wafers in all orientations with unpolished and polished sides.
2 Inch C-plane(0001) Sapphire Wafers
CRYSCORE polishes the sapphire wafers by special CMP (Chemical Mechanical Polishing) technology, which is a widely used planarization technology.
3 Inch C-plane(0001) Sapphire Wafers
Sapphire is an important material used widely in the growth of III-nitride epitaxial layers (GaN, AlN, InN, AlGaN, InGaN, InAlN, etc.)
4 Inch C-plane(0001) Sapphire Wafers
Sapphire wafer is being used extensively as a substrate for III-V nitrides and for many other epitaxial films.
5 Inch C-plane(0001) Sapphire Wafers
5-inch c sapphire wafers are not as common as other specifications. However, its quality manufactured by CRYSCORE is as good as gold.
6 Inch C-plane(0001) Sapphire Wafers
Based on the continuous upgrade of sapphire technology and the rapid expansion of the application market, 4 inch and 6 inch c plane sapphire substrate wafers will be more adopted by mainstream chip companies.
8 Inch C-plane(0001) Sapphire Wafers
The 8-inch optical sapphire wafers can enable chip maker to roll out more productivity, which will help them drive down costs dramatically.

If you want to know more kinds of patterned sapphire substrate, please visit our website.

SAPPHIRE WINDOWS(2022年)

cryscore — 2022-10-28T18:12:10+0900

https://www.cryscore.com/products/sapphire-windows/

Sapphire Windows
Sapphire has a wide transmission range, spanning the three wavelength bands of ultraviolet, visible light and infrared and has high thermal shock resistance, high hardness and wear resistance. Almost no substance except the diamond can produce scratches on its surface, and its chemical properties are stable which is insoluble in most acid solutions. Furthermore, because of its high strength, windows made of sapphire are thinner.

A high grade of sapphire would have little or no light scatter or lattice distortion and be used mainly for the most demanding optical applications. CRSYCORE is a professional sapphire windows supplier who uses optical grade one single crystal material to ensure its high quality. Our sapphire optical windows have been polished to surface quality of 10/5 scratch-dig, and the surface roughness is lower than 0.2 nm (for C-plane). Both coated and uncoated sapphire optical windows can be provided. Besides, we supply custom sapphire windows with any size and thickness in complete orientations.

Different Types of Sapphire Windows
Round Sapphire Windows
Square & Rectangular Sapphire Windows
Custom Sapphire Windows
Sapphire has better light transmittance in the wavelength range of 0.20 - 5.50 μm and the infrared transmittance hardly changes with temperature.

Dia. 110mm Sapphire Windows
Dia. 0.5-inch Sapphire Windows
Other Round Sapphire Windows

If you want to know more types of custom sapphire optics, please contact us.

SAPPHIRE WAFERS / SAPPHIRE SUBSTRATES(2022年)

cryscore — 2022-10-28T18:11:36+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

Due to the less mismatched lattice and stable chemical and physical properties, sapphire(Al2O3) wafer is the popular substrates for III-V nitrides, superconductor and magnetic epi-film. They are widely used in GaN and thin-film epitaxial growth, silicon on sapphire, LED market and optics industry.

CRYSCORE is a professional sapphire wafer manufacturer who manufactures 99.999% high purity single crystal polished sapphire wafers, for epitaxy. And our sapphire (Al2O3) substrates feature excellent surface finish, which is the key LED parameter.

If you are looking for reliable sapphire substrate manufacturers, contact us now.

Different Types of Sapphire Wafers
CRYSCORE can offer Epi-Ready grade polished sapphire substrates wafer with a very low surface roughness in complete orientation options.

FEATURES OF SINGLE CRYSTAL SAPPHIRE
Among all China sapphire substrate suppliers, CRYSCORE has always devoted ourselves to the quality of sapphire substrates.

1. Optical sapphire has a high optical transmittance, so it is widely used as microelectronic tube dielectric material, ultrasonic conduction element, waveguide laser cavity, and other optical elements, as window materials for infrared military devices, space vehicles, high-intensity lasers and optical communications.

2. Sapphire has high rigidity, high strength, high working temperature, abrasion resistance, corrosion resistance characteristics, so sapphire substrate is often used in harsh environments, such as boiler water gauge (high-temperature resistance), commodity bar code scanner, bearing, and other precision manufacturing (wear resistance), coal, gas, well detection sensors and detector windows (anti-corrosion).

3. Sapphire has the characteristics of electrical insulation, transparency, good thermal conductivity, and high rigidity, so it can be used as the substrate material of integrated circuits, such as LED and microelectronic circuits, ultra-high-speed integrated circuit.

CRYSCORE'S EXCELLENT SAPPHIRE WAFERS
99.999 % high purity single crystal Al2O3 material.
Special CMP (Chemical Mechanical Polishing) technology to ensure the performance of Al2O3 substrate at a low cost.
Excellent surface quality in all orientations (less than 0.2 nm for C-plane, less than 0.5 nm for A-plane, M-plane, R-plane, N-plane, V-plane, 10-14, etc.)
Cleaned in class 100 cleanroom by ultrapure water with quality above 18MΩ *cm.
25 pcs a pack or single pack is available to maximize customer flexibility in their research.
Traceable product serial number.
Compact carton packaging for safer shipping and cost-saving.
Standard wafers are Generally in stock to ensure a quick delivery.
As one of best China sapphire wafer manufacturers, CRYSCOR is committed to supirior quality and cost-eefective sapphire substrates for your business.

LOOK AT WHERE SAPPHIRE WAFER APPLIED
CRYSCORE is one of sapphire ingot manufacturers, our unpolished or polished sapphire wafers are widely used in the industries of LED, semiconductor, microelectronic and more.

Now the sapphire substrate cost is low, if you have needs to buy sapphire wafer, please contact us.

SAPPHIRE INGOTS/RODS(2022年)

cryscore — 2022-10-28T18:10:41+0900

https://www.cryscore.com/products/sapphire-ingots-sapphire-rods.html

Sapphire ingots are typically used as raw materials for further processing. These sapphire rods and sapphire ingots are uniformly shaped, usually as cylinders. The most sapphire crystal grows in A-axis, and the most widely used sapphire substrate in the LED market is its C-plane (0001). Therefore, it is necessary to drill the c-plane sapphire ingot from the side of the crystal.

As one of professional sapphire ingot manufacturers, CRYSCORE provides sapphire optics rods and ingots with ground surfaces for further processing and polishing. They are cored from high-grade Kyropoulos grown boules. We supply dia. 2-inch to 8-inch sapphire rod and ingot with any orientation and custom specifications. Flats are available upon request.

If you want to know more about sapphire ingot price, please contact us.

R-PLANE (1-102) SAPPHIRE WAFERS(2022年)

cryscore — 2022-10-28T18:10:05+0900

https://www.cryscore.com/products/r-plane-1-102-sapphire-wafers.html

R plane sapphire wafers are preferred for the hetero-epitaxial deposition of silicon used in microelectronic IC applications. R plane is the non-polar plane of sapphire. So the different positions of R-plane in sapphire devices, the mechanical, thermal, electrical and optical properties of custom sapphire optics devices will vary greatly, which will also affect the subsequent processing performance, processing efficiency and processing yield of sapphire devices.

In order to make the crystal structure of sapphire ingot and subsequent sapphire products consistent, the more common method is to process an A-direction surface on the sapphire ingot as the flat orientation of the polished sapphire wafer (subsequent sapphire products), so that the R-direction position of sapphire ingot and the wafer is consistent.

LED SUBSTRATES(2022年)

cryscore — 2022-08-18T18:10:32+0900

https://www.cryscore.com/led-substrates.html

LED remains the dominant sapphire application. Sapphire substrates are ideal for use in LED applications due to high-temperature resistance, high strength, good electrical insulation, and low dielectric loss. Sapphire substrate in LED lighting helps prevent stray currents caused by radiation from spreading to nearby circuit elements. Its crystal structure also allows LED lights to have a wider beam angle.

The Development of Wafers in the Led Industry
In the past, 2 to 4-inch sized wafers were commonplace, but there has been a recent transition towards 6 to 8-inch wafers. Larger sized wafer allows manufactures to incorporate more LED chips along the outside edge, increasing the brightness of the LEDs. The use of patterned sapphire substrate (PSS) can further increase brightness due to the reduction in density of the GaN layer and enhancement of light extraction efficiency. With the penetration rate for LED-based general lighting continuing to rise, large-sized PSS will become necessary to meet the demands of the rapidly growing lighting market.

As the sapphire substrate is still a key building block for LEDs, general lighting is expected to continue providing solid demand for substrate material from the LED industry in the following years.

LED (Light Emitting Diode) has been widely regarded as the main lighting tool of the next generation. Compared with the incandescent lamps currently used, LEDs have the advantages of long life, energy-saving, and safety. The preparation of blue LEDs needs to rely on GaN films. There are many substrate materials used for growing GaN films, such as sapphire and SiC are the most commonly used.

In recent years, sapphire has become the best and most commonly used substrate material, because of its small lattice mismatch coefficient with GaN and good light transmission. The lattices of the single-crystal sapphire substrate and GaN can match each other, and sapphire has good high-temperature stability and mechanical properties which can meet the requirements of high-temperature resistance during the growth of GaN film.

Moreover, a single-crystal sapphire substrate has better light transmission in the visible range. In addition, there is more research regarding GaN film on sapphire, the production technology of GaN on sapphire is relatively mature and the price is relatively cheap, so single-crystal sapphire has become the key substrate material for making white, blue, green, and blue-green GaN substrates.

Factors Must Be Considered when Evaluating Substrate Materials
1. The degree of structural matching between the substrate and the epitaxial film: the crystal structure of the epitaxial material and the substrate material are the same or similar, the lattice constant mismatch is small, the crystallization performance is good, and the defect density is low.

2. The degree of thermal expansion coefficient matching between the substrate and the epitaxial film. The matching of the thermal expansion coefficient is very important. The thermal expansion coefficient of the epitaxial film and the substrate material is too large and may reduce the quality of the epitaxial film. Therefore, during the device operation, due to heat generation, This can cause device damage.

3. The degree of matching the chemical stability of the substrate and the epitaxial film: the substrate material must have good chemical stability, not be easily decomposed and corroded in the temperature and atmosphere of epitaxial growth, and the quality of the epitaxial film cannot be caused by the chemical reaction with the epitaxial film decline.

4.Difficulty and cost of material preparation: Considering the needs of industrialization development, the preparation of substrate materials requires conciseness, the cost should not be high, and the substrate size is generally not less than 2 inches.

specialized in high-quality sapphire wafers and optical windows since 2008. We provide optical sapphire, sapphire rod, sapphire substrate for led, led sapphire wafer, led sapphire substrate, led substrate, LED sapphire and etc. Want to know more? Please contact us.

GAN ON SAPPHIRE(2022年)

cryscore — 2022-08-18T18:10:05+0900

https://www.cryscore.com/gan-on-sapphire.html

GAN ON SAPPHIRE

Brief Introduction of GaN
GaN is the major material used for blue-light/green-light LED due to its ability to combine electrical parts and LED optical parts, increasing LED product efficiency.

The GaN-based LEDs grown on the sapphire substrate have current transport along the lateral direction due to the insulating nature of the substrate. In addition, the finite resistance of the n-type GaN buffer layer causes the p–n junction current to be nonuniform and crowds near the edge of the contact.

The most frequently chosen crystallographic planes have been the R-plane, C-plane, and A-plane of sapphire. The tremendous mismatch between the lattices of GaN and sapphires can be partly overcome by the use of thin buffer layers of AlN or GaN. In spite of the lattice-matching problem, many useful optoelectronic and electronic devices can be made.

Characteristics and Applications of GaN
GaN is the third-generation semiconductor material after silicon and gallium arsenide. Its wide-bandgap characteristics make that GaN is an ideal material for blue light output. In addition, GaN also has a small dielectric constant, excellent thermal conductivity and thermal stability, which can meet the requirements of high frequency, high temperature, high pressure and high power applications.

These properties make GaN in aerospace, satellite communications, storage display, new type Light source and nuclear energy development have a wide range of application prospects. However, the bottleneck that once limited the application of GaN was the growth process of GaN, and the key to the growth process was the choice of substrate materials.

Although there is a large lattice fit between the sapphire crystal and the GaN crystal, the crystal structures of the two are the same, and the sapphire still maintains stable chemical properties at high temperatures. In addition, for its excellent heat dissipation performance, sapphire wafer can be used as GaN Ideal substrate material for growth processes. Growing GaN on a sapphire substrate is easy to obtain large-size epitaxial wafers, and the price is relatively cheap.

With the development and improvement of molecular beam epitaxy and chemical vapor deposition growth technology, the quality of epitaxially growing GaN crystals on sapphire is getting higher and higher.

If you are interested in our products, contact us now to get more info about the price of sapphire wafer and sapphire substrate.

specialized in high-quality sapphire wafers and optical windows since 2008. We provide sapphire optics, sapphire rod, sapphire ingot, Patterned sapphire substrate and etc. Want to know sapphire window price or more? Please contact us.

CRYSTAL STRUCTURE OF SAPPHIRE, THE KING OF LED SUBSTRATES(2022年)

cryscore — 2022-08-18T18:09:37+0900

https://www.cryscore.com/crystal-structure-of-sapphire-the-king-of-led-substrates.html

1. What is sapphire?

As the king of LED substrate, the name of sapphire is from Latin Spphins, which means blue. It belongs to the corundum group mineral, with cubic crystal system. In the gem world, all kinds of gem grade corundum other than ruby are called sapphire. Sapphire, ruby, emerald, goldwater Bodhi, tourmaline, Tanzanite and so on are all belong to the genus of colored gemstones.

Containing iron (FE) and titanium (TI) and other trace elements, corundum presents blue, sky blue, light blue and other colors. Among them, royal blue and cyan are the best.

The mineral name of sapphire is corundum, which belongs to corundum group. In fact, in nature, except for rubies, corundums of other kinds of colors, such as blue, light blue, green, yellow, gray and colorless, are all called sapphire, or color sapphire, that is, adding the color name before the sapphire, such as pink sapphire. The main component of sapphire is alumina (Al2O3). The blue sapphire is due to a small amount of titanium (TI) and iron (FE) impurities.

2. Crystal structure of sapphire

As the one of the best sapphire substrate manufacturers, let Cryscore introduce sapphire's structure.

The sapphire crystal structure is hexagonal. The crystal morphology is usually cylindrical, short columnar, plate-shaped, and the geometry is mostly granular or dense block. It's transparent to translucent, and has glass luster. Its refractive index is 1.76-1.77, and birefringence is 0.008. It has strong dichroism and heterogeneous. Sometimes it has a special optical effect, starlight effect. The hardness is 9 and the density is 3.95-4.1g/cm3. It has no cleavage or fracture. Because of the characteristics of sapphire crystal structure, when sapphire is cut and ground to arc shape, its interior is rich in three groups of inclusions parallel to the bottom and directionally arranged, which can produce beautiful six ray starlight, so it is also called starlight sapphire.

CRYSCORE OPTOELECTRONIC LIMITED has been a professional manufacturer specialized in high-quality sapphire wafers and optical windows since 2008. We provide custom sapphire optics, sapphire rod, c axis sapphire and etc. Want to know more? Please contact us.

WHAT IS THE TRANSMISSION RANGE OF SAPPHIRE?(2022年)

cryscore — 2022-08-18T18:09:05+0900

https://www.cryscore.com/what-is-the-transmission-range-of-sapphire.html

The sapphire transmission Range of Sapphire Optics

Sapphire is the second highest hardness crystal. Its various properties make it suitable for harsh environments, including ultra-high surface hardness, high thermal conductivity, and high resistance to chemical acids and alkalis. Compared with a variety of standard optical materials, sapphire optics provide a thinner design with a transmission range of 0.15-5.5μm of thickness to achieve the best performance from ultraviolet light to mid-infrared.

Introduction of CRYSCORE

CRYSCORE OPTOELECTRONIC LIMITED provides high-quality sapphire wafers and optical sapphire windows. We have more than 12 years of experience. CRYSCORE can provide standard or customized sapphire wafers from 1 inch to 8 inches, including wafers of any crystal orientation and thickness for epitaxy, and sapphire windows of any specification for optical devices. At the same time, we can also provide patterned sapphire substrates and sapphire ingot. From raw material procurement to product delivery, we have strict procedures. Each sapphire wafer undergoes strict inspection before leaving the factory. All our employees will do their best to ensure that you always receive stable quality sapphire wafers. Our sapphire wafers have been supplied to the United States, Canada, Germany, the United Kingdom, France, Poland, Switzerland, Saudi Arabia, Turkey, Japan and South Korea. We look forward to reaching cooperation with you!

WHAT IS SAPPHIRE INGOT AND ITS APPLICATION(2022年)

cryscore — 2022-08-18T18:08:40+0900

https://www.cryscore.com/what-is-sapphire-ingot-and-its-application.html

Sapphire ingots are aluminum oxide crystals used to produce sapphire substrates.

The application of the sapphire ingot is the application of sapphire. As long as we know the performance of sapphire, we can know the application of sapphire ingots. Sapphire has a hexagonal lattice structure, and many properties are determined by its crystal orientation. Through the epitaxial film growth, different crystal orientations will show different lattice matching with the target material. Sapphire has a certain birefringence, and a special crystal axis is used in some optical fields.

For example, polarized substrate:

C-section sapphire substrate is used to grow III-V and II-VI group deposited films, such as Gallium Nitride, which can produce blue LED products, laser diodes, and infrared detector applications.

A-typle substrates produce uniform permittivity/dielectric, and high insulation is used in Hybrid Microelectronics. High-temperature superconductors can be produced by long crystals on A-type substrates.

Different deposited silicon externally elongated crystals grown on R-type substrates has been used in microelectronic integrated circuits. Because of its high capacitance, sapphire is the best choice for hybrid substrates, such as in microwave integrated circuits. In addition, high-speed integrated circuits and pressure sensors can also be formed in the process of epitaxial silicon film making. The R-type substrate growth can also be used in the fabrication of mounds, other superconducting components, high resistance resistors, and gallium arsenide.

M. Both type A and type R can grow non-polar or semi-polar Gan. Sapphire as a commercial product still needs a lot of research to improve the material quality of Gan epitaxial.

Purity:

Sapphire is an insulating material, and its semiconductor properties are changed by dopants and impurities. Therefore, most of the purity control is not due to the strict control of the substrate materials (silicon, gallium arsenide, indium phosphide...). However, some trace dopants change their optical properties (color, photoconductive range), which is very important for applications in some fields (Optics, military).

Because the purity of sapphire has a strong influence on the electrical properties and cross-contamination of the metal surface when applied to CMOS (complementary metal-oxide-semiconductor), it is also very important in the application of SOS (silicon on sapphire technology). There is no evidence that sapphire purity has an impact on LED applications, and SOS manufacturers attribute their characteristics to sapphire substrates.

specialized in high-quality sapphire wafers and optical windows since 2008. We provide sapphire optics, sapphire rod, sapphire ingot, Al2O3 substrate and etc. Want to know more? Please contact us.

THE OBVIOUS ADVANTAGES OF SAPPHIRE WINDOWS(2022年)

cryscore — 2022-08-18T18:08:10+0900

https://www.cryscore.com/the-obvious-advantages-of-sapphire-windows.html

Ⅰ. Advantages of sapphire windows themselves
As a kind of corundum, sapphire has the characteristics of high strength, high hardness, high temperature resistance, corrosion resistance, good wear resistance, small friction coefficient and high resistivity. In addition, sapphire also has good thermal conductivity and electrical insulation. The most important thing is that sapphire has good light transmittance in visible and MWIR bands, which is often considered as the ideal material for infrared military equipments and satellite optical windows.

Ⅱ. sapphire window properties
Due to the characteristics of sapphire, the sapphire window transmission range of polished sapphire is from 170nm to 5.3μM. It has the characteristics of high strength, high hardness and high chemical stability. Its strength is five times of that of glass, and it is resistant to high temperature up to 2000°C.

The superiority of sapphire windows attribute also determines its wide application range. The polished sapphire glass can be used as sapphire optical window, lens protector, window, armored window, wear-resistant window/optical element, optical window having resistance of high temperature and impact, etc. Sapphire glass with high quality is usually a kind of parallel plane plate, which is usually used as the protective window of electronic sensor or external environment detector.

When selecting the window, the user should consider whether the transmission properties of the material and the mechanical properties of the substrate meet the application requirements. The window slice does not change the magnification of the system. As a professional supplier of sapphire windows, Cryscore Optoelectronic Limited will provide you with sapphire windows of various sizes and thicknesses. Welcome to select and buy.

specialized in high-quality sapphire wafers and optical windows since 2008. We provide custom sapphire optics, sapphire rod, sapphire ingot, Al2O3 substrate and etc. Want to know more? Please contact us.

SILICON ON SAPPHIRE(2022年)

cryscore — 2022-08-18T18:07:43+0900

https://www.cryscore.com/silicon-on-sapphire.html

A Brief Introduction of Silicon on Sapphire Technology

Silicon on sapphire technology is a hetero-epitaxial process for metal-oxide-semiconductor (MOS) integrated circuit (IC) manufacturing that consists of a thin layer (typically thinner than 0.6 µm) of silicon grown on a sapphire (Al2O3) wafer. SOS is part of the silicon-on-insulator (SOI) family of CMOS (complementary MOS) technologies. Typically, high-purity artificially grown sapphire crystals are used.

The silicon is usually deposited by the decomposition of silane gas (SiH4) on heated sapphire substrates. The advantage of sapphire is that it is an excellent electrical insulator, preventing stray currents caused by radiation from spreading to nearby circuit elements. SOS faced early challenges in commercial manufacturing because of difficulties in fabricating the very small transistors used in modern high-density applications.

This is because the SOS process results in the formation of dislocations, twinning and stacking faults from crystal lattice disparities between the sapphire and silicon. Additionally, there is some aluminum, a p-type dopant, contamination from the substrate in the silicon closest to the interface.

Why is Silicon on Sapphire Technology So Important to Integrated Circuit
Due to sapphire has high permittivity that can eliminate the interaction between components of the integrated circuit, not only can reduce leakage current and parasitic capacitance, enhance radiation resistance and reduce power consumption but also can improve the level of integration and two-layer wiring, thus, sapphire is the ideal material for large scale and very large scale integrated circuit.

Silicon on sapphire technology provides ideal isolation and reduces the parasitic capacitance at the bottom of the PN junction, so it is suitable for high-speed large scale integrated circuits to achieve high speed and low power consumption. This process is generally used to make CMOS circuits.

In addition, in the SOS microelectronic circuit design and production, all kinds of semiconductor devices usually need to make on the structural integrity silicon thin film, and because thermal expansion coefficient of silicon is similar to sapphire, a silicon monocrystalline film (100) can be grown on the surface orientation(1-102) of the sapphire substrate by heteroepitaxy.

At present, sapphire crystal has become a widely used substrate for the growth of semiconductor materials.
CRYSCORE OPTOELECTRONIC LIMITED has been a professional manufacturer specialized in high-quality sapphire wafers and optical windows since 2008. We provide optical sapphire, sapphire rod, Sapphire wafer and etc. Want to know more? Please contact us.

Silicon on Sapphire(2021年12月10日)

cryscore — 2021-12-10T10:36:02+0900

https://www.cryscore.com/silicon-on-sapphire.html

As a professional sapphire wafer manufacturer, CRYSCORE can provide standard or custom sapphire wafers with any orientation applied to epitaxy, as well as sapphire windows with any specifications applied to sapphire optics. Patterned sapphire substrates and sapphire ingots also can be provided. Expert in sapphire optics manufacturing.

SILICON ON SAPPHIRE
A Brief Introduction of Silicon on Sapphire Technology
Silicon on sapphire (SOS) technology is a hetero-epitaxial process for metal-oxide-semiconductor (MOS) integrated circuit (IC) manufacturing that consists of a thin layer (typically thinner than 0.6 µm) of SOS wafer. SOS is part of the silicon-on-insulator (SOI) family of CMOS (complementary MOS) technologies. Typically, high-purity artificially grown sapphire crystals are used.

The silicon is usually deposited by the decomposition of silane gas (SiH4) on heated sapphire substrates. The advantage of sapphire is that it is an excellent electrical insulator, preventing stray currents caused by radiation from spreading to nearby circuit elements. Silicon on sapphire wafers faced early challenges in commercial manufacturing because of difficulties in fabricating the very small transistors used in modern high-density applications.

At present, sapphire crystal has become a widely used substrate for the growth of semiconductor materials.

Standard Sapphire Wafers (C-plane)(2021年12月10日)

cryscore — 2021-12-10T10:35:28+0900

https://www.cryscore.com/products/standard-sapphire-wafers/

STANDARD SAPPHIRE WAFERS (C-PLANE)
CRYSCORE can offer Epi-Ready grade sapphire wafer with a very low surface roughness in complete orientation options.

Different Sizes of Standard Sapphire Wafers

Technical Applications of Standard Sapphire Wafers
C plane sapphire wafers are widely used to grow III-V and II-VI deposited films of wide band-gap nitride and oxide semiconductor materials such as gallium nitride (GaN), aluminum nitride (AlN), indium nitride (InN), zinc oxide (ZnO ultraviolet light emission) and tin oxide (SnO2 ultraviolet luminescent material), etc.

In addition, standard C plane sapphire wafer is widely applied to fabricate LED white and blue light, ultraviolet and deep UV LED epitaxial wafers by Metal-Organic Vapor Deposition(MOCVD), Molecular Beam Epitaxy (MBE), Plasma Enhanced Chemical Vapor Deposition(PECVD) and other epitaxy growth methods.

CRYSCORE standard sapphire wafers also are used as the C plane sapphire substrate of heterojunction bipolar transistor (HBT), a laser diode (LD), UV detector, nanotube, and the heat dissipation material of high temperature and high power high-frequency electronic device.

Competitive Advantages of CRYSCORE's Sapphire Wafers
99.999 % high purity single crystal Al2O3 material.
Special CMP (Chemical Mechanical Polishing) technology to ensure its performance at a low cost.
Excellent surface quality in all orientations (less than 0.2 nm for C-plane, less than 0.5 nm for A-plane, M-plane, R-plane, N-plane, V-plane, 10-14, etc.)
Cleaned in class 100 cleanroom by ultrapure water with quality above 18MΩ *cm.
25 pcs a pack or single pack is available to maximize customer flexibility in their research.
Traceable product serial number.
Compact carton packaging for safer shipping and cost-saving.
Standard wafers are Generally in stock to ensure a quick delivery.
As a professional sapphire wafer supplier, CRYSCORE aims to provide customers with the best products and services, and let our technology benefits the world.

Sapphire Windows(2021年12月10日)

cryscore — 2021-12-10T10:34:38+0900

https://www.cryscore.com/products/sapphire-windows/

SAPPHIRE WINDOWS
Sapphire has a wide transmission range, spanning the three wavelength bands of ultraviolet, visible light and infrared and has high thermal shock resistance, high hardness and wear resistance. Almost no substance except the diamond can produce scratches on its surface, and its chemical properties are stable which is insoluble in most acid solutions. Furthermore, because of its high strength, windows made of sapphire are thinner.

A high grade of sapphire would have little or no light scatter or lattice distortion and be used mainly for the most demanding optical applications. CRSYCORE is a professional sapphire windows manufacturer and sapphire windows supplier who uses optical grade one single crystal material to ensure its high quality. Our optical windows have been polished to surface quality of 10/5 scratch-dig, and the surface roughness is lower than 0.2 nm (for C-plane). Both coated and uncoated sapphire windows can be provided. Besides, we supply custom sapphire windows with any size and thickness in complete orientations.

Round Sapphire Windows
Sapphire has better light transmittance in the wavelength range of 0.20 - 5.50 μm and the infrared transmittance hardly changes with temperature.

Square & Rectangular Sapphire Windows
Square and rectangle sapphire windows are widely used in many fields, such as high-temperature infrared windows, bar code scanning windows and various optical components.

Custom Sapphire Windows
Square and rectangle sapphire windows are widely used in many fields, such as high-temperature infrared windows, bar code scanning windows and various optical components.

As one of the leading sapphire window suppliers and sapphire window manufacturers, we supply custom sapphire windows with a reasonable sapphire window price.

LED Substrates(2021年12月10日)

cryscore — 2021-12-10T10:34:03+0900

https://www.cryscore.com/led-substrates.html

LED SUBSTRATES
LED remains the dominant sapphire application. Sapphire substrates are ideal for use in LED applications due to high-temperature resistance, high strength, good electrical insulation, and low dielectric loss. Sapphire substrate in LED lighting helps prevent stray currents caused by radiation from spreading to nearby circuit elements. Its crystal structure also allows LED lights to have a wider beam angle.

The Development of Wafers in the Led Industry
In the past, 2 to 4-inch sized wafers were commonplace, but there has been a recent transition towards 6 to 8-inch wafers. Larger sized LED sapphire wafer allows manufactures to incorporate more LED chips along the outside edge, increasing the brightness of the LEDs. The use of patterned LED sapphire substrate (PSS) can further increase brightness due to the reduction in density of the GaN layer and enhancement of light extraction efficiency. With the penetration rate for LED-based general lighting continuing to rise, large-sized PSS will become necessary to meet the demands of the rapidly growing lighting market.

As the LED sapphire substrate is still a key building block for LEDs, general lighting is expected to continue providing solid demand for substrate material from the LED industry in the following years.

In recent years, sapphire has become the best and most commonly used substrate material, because of its small lattice mismatch coefficient with GaN and good light transmission. The lattices of the single-crystal sapphire substrate for LED and GaN can match each other, and sapphire has good high-temperature stability and mechanical properties which can meet the requirements of high-temperature resistance during the growth of GaN film.

GaN on Sapphire(2021年12月10日)

cryscore — 2021-12-10T10:33:12+0900

https://www.cryscore.com/gan-on-sapphire.html

GAN ON SAPPHIRE
Brief Introduction of GaN
GaN is the major material used for blue-light/green-light LED due to its ability to combine electrical parts and LED optical parts, increasing LED product efficiency.

If you are interested in our products, contact us now to get more info about the price of sapphire wafer and sapphire substrate.

THE PROCESS OF POLISHING SAPPHIRE WAFER (2)(2021年11月18日)

cryscore — 2021-11-18T11:11:25+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

With over 13 years of experience, CRYSCORE provides 1-inch to 8-inch standard or custom sapphire wafers with any orientation and any thickness applied to epitaxy, as well as sapphire windows with any specifications applied to sapphire optics. Patterned sapphire substrates and sapphire ingots also can be provided.

Third, waxless substrate.

To polish a wafer on a machine, there must be a carrier that can hold it, and the waxless substrate plays this role. The wafers to be processed are put on it one by one for processing. Therefore, the substrate must be selected with good wear resistance, not easy to degumming, and high-temperature resistance.

Fourth, the temperature.

As we all know, a chemical reaction must reach the appropriate temperature to occur, and too high or too low temperature may make the reaction invalid. Our polished sapphire wafer is chemical mechanical polishing. Only by first softening the wafer can the purpose of grinding be achieved through mechanical friction. And only if the size is worn off, the thickness is uniform, and the surface is basically flawless, it is inspected on the upper layer of various inspection instruments to meet the requirements of no visible scratches, corrosion pits, and all indicators. How to select the best polishing temperature will directly affect the polishing rate, the amount of polishing liquid used, and the consumption rate of consumables.

In addition to the above, there are various factors, such as personnel training, polishing pressure, rotating time. CRYSCORE will not summarize them one by one. In a word, the polished sapphire wafer is a process that requires all aspects to achieve the best configuration, because it requires perfection and no defects. As long as one factor is unreasonable, it may lead to a situation of total failure.

THE PROCESS OF POLISHING SAPPHIRE WAFER (PART 1)(2021年11月18日)

cryscore — 2021-11-18T11:10:29+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

The last process of the sapphire wafer is also the most important one, namely polished sapphire wafer. The quality of polishing process directly determines whether the product can be sent out and whether it meets the requirements of customers. The competition in this field is very fierce and also very strict. The following is to talk about the factors that determine the polishing yield.

1. Polishing fluid.
Sapphire is a substance whose hardness is inferior to diamond in nature. Therefore, polishing sapphire wafer must first soften the sapphire to achieve the purpose of grinding. At present, alkaline polishing fluid is widely used in the industry to achieve better surface effect. The polishing fluid is very expensive, 30 or 40 yuan per kilogram, and one machine may consume about 100 kilograms a day, so its cost is the highest . How to better and more effectively use the polishing fluid is a major issue for us.

2. Polishing cloth.
The polishing cloth is used to rub the wafer, and it should be used with the polishing fluid. Therefore, if the polishing fluid is selected, the polishing cloth that is most suitable for the polishing fluid must be found. If the polishing cloth and the polishing fluid are not matched properly, the product quality will be greatly affected, and even the product will be unqualified. When choosing a polishing cloth, we must fully consider wear resistance, firmness and durability. By the way, wafer thickness is strictly required and must be controlled within a certain range. Therefore, the selection of suitable polishing cloth directly affects the product quality.

APPLICATION RANGE OF SAPPHIRE CRYSTAL(2021年11月18日)

cryscore — 2021-11-18T11:09:17+0900

https://www.cryscore.com/products/sapphire-ingots-sapphire-rods.html
https://www.cryscore.com/led-substrates.html

Sapphire (a-Al2O3) is a multifunctional oxide crystal with excellent optical, physical, and chemical properties.

In the field of optoelectronics, sapphire crystal is the preferred substrate material for manufacturing gallium nitride (GaN) light-emitting diode (LED); in the field of optical communication, sapphire crystal is not only used as a short wavelength active device, but also as a polarizer of passive devices; in the field of laser, sapphire is an excellent laser medium material (such as Ti: Al2O3, Cr: Al2O3); in the field of superconductivity, sapphire crystals can not only produce Y-series, La-series high-temperature superconducting films but also grow new practical MgB2 high-temperature superconducting films. In the field of national defense, sapphire crystal is an important window material for infrared military devices, missiles, submarines, satellite space technology, high-energy detection, and high-power lasers. In addition, CRYSCORE is also acted as a sapphire ingot manufacturer providing sapphire ingots as raw material for further fabrication.

Whether the led sapphire substrate in the optoelectronic field or the sapphire window in the optical communication field, there are very high requirements for its processing quality. For example, the sapphire substrate of GaN grown by metal-organic chemical vapor deposition (MOCVD) requires a super smooth and non-destructive surface. At present, a super smooth surface refers to the surface whose surface roughness is less than 1nm (RMS). The non-destructive surface means that the machined surface can not have the processing metamorphic layer, and the surface lattice is complete.

SAPPHIRE WAFER CLEANING EQUIPMENT(2021年11月18日)

cryscore — 2021-11-18T11:08:28+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

Ultrasonic cleaning machine
Ultrasonic cleaning machine is a kind of cleaning equipment widely used in the microelectronics industry. The principle of ultrasonic cleaning is that under the strong ultrasonic effect (the commonly used ultrasonic frequency is 20-40khz), the inside of the cleaning agent will produce sparse and dense parts, and the sparse part will produce nearly vacuum cavity. When the cavity disappears, strong local pressure will be generated nearby, it breaks the chemical bond in the molecule and desorbs the impurities on the surface of the sapphire wafer. When the ultrasonic frequency and the vibration frequency of the cavity resonate, the mechanical force reaches the maximum, and a large amount of heat energy accumulates in the bubble, which makes the temperature rise and promotes the occurrence of the chemical reaction. The improvement of ultrasonic power is helpful to promote the cleaning effect. Because the removal effect of the ultrasonic cleaning machine for small particles less than 1 μm is not ideal, the ultrasonic cleaning machine is mostly used to remove large contaminated particles attached to the surface of the sapphire wafer.

Megasonic cleaning machine
Megasonic cleaning machine not only preserves the advantages of the ultrasonic cleaning machine but also overcomes the shortcomings of the ultrasonic cleaning machine. The mechanism of megasonic cleaning is to clean the sapphire wafer through a high-frequency vibration effect. During cleaning, the transducer emits high-energy sound waves with a wavelength of 1.5 μm and a frequency of 0.8 MHz. Under the push of this sound wave, the solution molecules move at high speed and its maximum instantaneous speed can reach 300 mm/s. Therefore, it is impossible to form cavities like ultrasonic clexaning, the only high-speed fluid wave can continuously impact the wafer surface, so that the dirt and fine particles attached to the sapphire chip surface are forced to be removed and enter the cleaning solution. The particles less than 0.2 μm on the wafer surface can be removed by megasonic cleaning, which has no effect on the ultrasonic waves. At present, megasonic cleaning machine has become an effective equipment for sapphire wafer cleaning.

WHAT IS SAPPHIRE INGOT AND ITS APPLICATION(2021年11月18日)

cryscore — 2021-11-18T11:07:37+0900

https://www.cryscore.com/products/sapphire-ingots-sapphire-rods.html
https://www.cryscore.com/

Sapphire ingots are aluminum oxide crystals used to produce sapphire substrates.

The application of the sapphire ingots is the application of sapphire. As long as we know the performance of sapphire, we can know the application of sapphire ingots. Sapphire has a hexagonal lattice structure, and many properties are determined by its crystal orientation. Through the epitaxial film growth, different crystal orientations will show different lattice matching with the target material. Sapphire has a certain birefringence, and a special crystal axis is used in some optical fields.

For example, polarized substrate:

C-section sapphire substrate is used to grow III-V and II-VI group deposited films, such as Gallium Nitride, which can produce blue LED products, laser diodes, and infrared detector applications.

M. Both type A and type R can grow non-polar or semi-polar Gan. Sapphire as a commercial product still needs a lot of research to improve the material quality of Gan epitaxial.

Purity:
Sapphire is an insulating material, and its semiconductor properties are changed by dopants and impurities. Therefore, most of the purity control is not due to the strict control of the substrate materials (silicon, gallium arsenide, indium phosphide...). However, some trace dopants change their optical properties (color, photoconductive range), which is very important for applications in some fields (Optics, military).

WHAT IS THE REASON FOR THE LONG POLISHING TIME OF SAPPHIRE WINDOW?(2021年06月05日)

cryscore — 2021-05-31T11:57:06+0900

https://www.cryscore.com/products/sapphire-windows/

What is the reason for the long polishing time of the sapphire window? Let's have a look.

The window piece is mainly used for mobile phones. Many manufacturers will be very careful in the production process, especially in the polishing process. After all, it is the last process completed. If it is not operated properly, it will cause great loss and affect the corporate image. The grinding stage of the sapphire window can be roughly divided into three stages: rough grinding, fine grinding, and polishing. Rough grinding is to make it uniform, and fine grinding is to flatten it. The last one is what we call the completion stage: polishing to make it mirror-like. From these processes, we can know that the polishing process of the sapphire window piece is actually the process of corrosion and sweeping, and finally, reach the ideal state. The thickness of corrosion can be accurate to the Ångstrom level. As far as CRYSCORE knows, polishing is to make all parts of the sapphire window (lens) mirror-like.

In addition, as far as we know, there are the following reasons for the failure to achieve the mirror effect: First, the mirror surface is round or square, and the square one may be a long strip with four corners that are not completely polished; Secondly, there are more or less pits on the window piece; Third, there may be defects such as watermarks like orange peel, which make the sapphire mirror look bad; There is also the last point that we have summed up. It may be that there is a haze on the mirror surface and an atomization phenomenon. Among them, the third one is naturally formed, and the other three are probably produced by grinding in the early stage, which is why the polishing time of the sapphire window piece is too long. Therefore, it is necessary to be more careful in the production of sapphire window pieces, and it is necessary to produce the most perfect mirror so that traders can sell at ease and buyers can rest assured, which is the ultimate goal.

CRYSCORE OPTOELECTRONIC LIMITED has been a professional manufacturer specialized in high-quality sapphire wafers and optical windows since 2008. We provide Sapphire Wafers, Sapphire Windows, sapphire optics, sapphire ingot and so on. Want to know more? Please contact us.

SAPPHIRE WAFER POLISHED BY CHEMICAL MECHANICAL POLISHING TECHNOLOGY(2021年06月04日)

cryscore — 2021-05-31T11:56:35+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

At present, the main methods of polished sapphire wafer polishing technologies are mechanical polishing, chemical polishing, ion beam polishing, laser beam polishing, and so on. However, each polishing method has some shortcomings. Although mechanical polishing can achieve global planarization, it is difficult to achieve nano level polishing with roughness RMS less than 1nm; chemical polishing can achieve nano level polishing, but can not achieve global planarization; ion beam polishing and laser beam polishing can not achieve global planarization, and are still in the experimental stage.

According to the physical and chemical properties of the sapphire wafer, combined with the above characteristics of mechanical polishing and chemical polishing, using chemical mechanical polishing (CMP) technology based on chemical polishing, it is a combination technology of mechanical grinding and chemical corrosion. It realizes global planarization, ultra-smooth, and nanoscale nondestructive precision polishing with the aid of grinding effect of ultrafine particles and chemical corrosion of slurry. The basic method of CMP is to rotate the wafer in the grinding fluid relative to the polishing pad and exert a certain pressure to finish polishing with the help of mechanical friction and chemical corrosion. The platform is driven by the motor, and the chip is stuck to the disc. The disc is driven by the motor and rotates in the same direction as the platform.

A layer of polishing fluid film is formed between the polished pad and the wafer, which is used to transport particles and pressure. The polishing fluid reacts with the wafer to convert insoluble substances into soluble substances (chemical reaction process), and then remove these soluble substances from the wafer surface by mechanical friction (mechanical grinding process). The two processes promote each other to form a virtuous cycle so as to make the surface of the polished wafer is smoothed and planarized globally.

In the chemical polishing process of sapphire and polishing solution, hydrolysis reaction, neutralization reaction of acid and alkali and double decomposition reaction of salt occur.

If the chemical reaction is weak and the mechanical grinding is strong, it will lead to the slow speed of the whole polishing process, and orange peel and wire drawing will occur on the surface of the polished wafer; if the chemical reaction is strong, but the mechanical grinding effect is weak, the whole polishing speed will be slowed down because the reactant resolution is slow. The reaction product can not leave the surface in time, and the reagent cannot be contacted, which block the reaction from continuing. At the same time, the surface of the polished sapphire wafers is easy to produce corrosion pits and ripples. In order to obtain a good quality polishing wafer, it is necessary to balance the chemical reaction and mechanical action in the polishing process.

If you are interested in more details about polished sapphire wafer, please feel free to contact us CRYSCORE.

CRYSCORE OPTOELECTRONIC LIMITED has been a professional manufacturer specialized in high-quality sapphire wafers and optical windows since 2008. We provide Sapphire Wafers, sapphire optics, Sapphire Windows and so on. Want to know more? Please contact us.

WHAT ARE THE MOST SUITABLE HIGH PRECISION PROCESSING METHODS FOR SAPPHIRE WAFERS？(2021年06月03日)

cryscore — 2021-05-31T11:56:03+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

Sapphire has the characteristics of high hardness, high brittleness, and chemical stability, which are the strengths as an optical material, but also the difficult points in processing. In order to obtain a sapphire wafer with an ultra-smooth finished surface, the following processing methods can be used:
1. Hydration polishing
The principle of hydration polishing: during the ceramic polishing machine processing, there is the friction between the polishing disk and the sapphire surface, of which the contact point generates high temperature and high pressure. Because of the activated atoms on the sapphire surface, a hydrous chemical reaction layer is formed on its surface when the hot water vapor molecules interact with water on it. Then with the help of hot water vapor, it takes advantage of the friction between the polishing disk and the sapphire surface to remove the hydration layer on the sapphire surface, so as to achieve an ultra-precision processing surface. It is a polishing method that utilizes the workpiece to generate a hydrous chemical reaction at the interface. The entire processing process of sapphire wafer avoids the surface scratches on the workpiece without using abrasives and polishing liquids, which is relatively green and environmentally-riendly.

2. Laser polishing
The principle of laser polishing: it can be divided into two methods through the thermal and photochemical action of laser and sapphire: cooling polishing and heat polishing. Cooling polishing removes the material by adopting a short-wavelength laser to decompose material chemically. After the sapphire surface material absorbs light molecules, the structure of its surface will be destroyed, so that the surface material can leave the body to realize the material removal. Heat polishing generally uses continuous long-wavelength lasers to remove the surface components of the material by melting, evaporation, etc. However, it is likely to cause cracks and rough surface on account of the great thermal temperature gradient and the thermal stress, which is more suitable for rough polishing. While the cooling polishing is more suitable for ultra-precision polishing for that the thermal stress is small in the polishing process, so cracks are rarely generated.

Those above are only two of the most suitable processing methods for sapphire wafers. It is an inevitable trend that the grinding industry will develop towards energy conservation and environmental protection in the future.

CRYSCORE OPTOELECTRONIC LIMITED has been a professional manufacturer specialized in high-quality sapphire wafers and optical windows since 2008. We provide Sapphire Wafers, Sapphire Windows, optical sapphire, Patterned sapphire substrate and so on. Want to know more? Please contact us.

SAPPHIRE MATERIAL STATUS AND MARKET ANALYSIS(2021年06月02日)

cryscore — 2021-05-31T11:55:27+0900

https://www.cryscore.com/products/custom-sapphire-windows.html

Sapphire is a single crystal of alumina（α-Al2O3), also known as corundum. Sapphire single crystal has a high melting point (2040 ℃), high hardness (Mohs hardness 9), stable chemical properties, good electrical insulation, especially excellent infrared transmittance. It can be used in near-infrared window, microwave tube dielectric material, ultrasonic transmission element, delay line, waveguide laser cavity and precision instrument bearing, balance blade, a semiconductor substrate, etc.

Sapphire single crystal and its products play an important role in both military and civil use because they are widely used in the national defense industry, aerospace science and technology research and civil fields. At present, the application fields of sapphire windows materials have been extended to civil fields, such as scanning windows of bar code scanner, fiber guide of the textile industry, camera outer lens, wear-resistant bearing, mobile phone panel and camera lens. It can be predicted that the demand for sapphire materials will rise rapidly in the future.

Sapphire is becoming more and more popular with smartphone manufacturers because it is tougher than glass and extremely scratch-resistant. Many professionals believe that the sapphire camera lens will become the "standard" part of high-end smartphones in the future.

The company should give full play to the existing technical advantages, equipment advantages and process advantages of the company, take the market as the guidance, improve the product structure, enter the key market of sapphire window materials as soon as possible, accelerate the transformation of scientific and technological achievements, promote the large-scale production of sapphire windows materials, and meet the market demand at home and abroad.

CRYSCORE provides custom sapphire windows for customers from different countries and areas, we are proud of the quality and services.

CRYSCORE OPTOELECTRONIC LIMITED has been a professional manufacturer specialized in high-quality sapphire wafers and optical windows since 2008. We provide Sapphire Wafers, Sapphire Windows, sapphire optics, Sapphire substrate and so on. Want to know more? Please contact us.

THE MANUFACTURING PROCESS OF SAPPHIRE WAFER(2021年06月01日)

cryscore — 2021-05-31T11:54:58+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/
Sapphire wafer manufacturing process:
1. Orientation: Accurately locate the sapphire crystal rod position on the slicing machine, so as to facilitate precise slicing processing
2. Slicing: Cut the sapphire crystal rod into thin wafers
3. Grinding: Remove the chip cutting damage layer caused by slicing and improve the flatness of the wafer
4. Chamfering: Trim the wafer edge into a circular arc to improve the mechanical strength of the wafer edge to avoid the defects caused by stress concentration
5. Polishing: Improve the roughness of the wafer to reach the epitaxial wafer's precision
6. Cleaning: Remove the contaminants on the wafer surface (such as dust particles, metals, organic contaminants)
7. Quality inspection: The wafer's quality (flatness, surface dust particles, etc.) shall be inspected with high-precision testing instruments to meet customer requirements

In practical production, the sapphire wafer is made by cutting the crystal bar and then grinding and polishing. Generally, the semiconductor wafer is cut into a wafer by wire cutting or multi-wire cutting machine. Because the cutting conditions always fluctuate during the cutting process, there are deviations in thickness and flatness of the cut sapphire. If the cutting conditions change, it will cause a deep damage layer. Due to the small amount of material surface removal during wafer polishing, grinding is needed to improve the flatness, curvature and parallelism deviation of the wafer before polishing and to reduce the thickness of the damage layer caused by cutting.

CEYSCORE is a reliable sapphire wafer supplier that you can trust, we are always ready to help you, contact us now.

CRYSCORE OPTOELECTRONIC LIMITED has been a professional manufacturer specialized in high-quality sapphire wafers and optical windows since 2008. We provide Sapphire Wafers, Sapphire Windows, optical sapphire, Al2O3 substrate and so on. Want to know more? Please contact us.

MECHANISM ANALYSIS OF CHEMICAL MECHANICAL POLISHING FOR SAPPHIRE WAFER(2021年05月01日)

cryscore — 2021-04-21T17:10:01+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

There are many kinds of polishing technology. From theory and practice, chemical mechanical polishing technology is widely used in processing some special materials, and the processing efficiency is obvious, which can realize the global flattening of materials.

In the sapphire processing technology, the core part is to study the chemical mechanical polishing technology, mainly including polishing mechanism, polishing method and polishing process. Chemical mechanical polishing (CMP) has been widely used in the processing of various materials since it was applied to integrated circuits. Many researchers have studied the material removal mechanism of CMP from the aspects of physical, chemical and control. However, at present, there are still many essential phenomena in CMP, which cannot be explained well.

Chemical mechanical polishing (CMP) is a complex multi-reaction process that uses mechanical grinding and chemical corrosion to remove materials. There are many factors that affect the CMP process of sapphire wafer supplier. The change of each influencing factor will affect the output parameters of the CMP system of sapphire wafer, that is, the mechanism of CMP material removal of the sapphire wafer is affected. There are subtle interactions. Chemical mechanical polishing (CMP) is the only polishing method which can realize global planarization, and it is easy to operate.

The main factors affecting CMP: pH value of polishing fluid, polishing pressure, rotating speed of the polishing disc, average particle size and particle size distribution of abrasive particles. In the process of processing, the balance of chemical and mechanical actions should be paid attention to. If the chemical action is stronger than the mechanical action, it will produce corrosion pits, orange peel and other defects; if the mechanical action is stronger than the chemical action, it will lead to scratches and scratches.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows and so on. Want to know about sapphire optics? Please contact us.

INTRODUCTION OF TRAPENNING DRILL(2021年04月30日)

cryscore — 2021-04-21T17:09:22+0900

https://www.cryscore.com/

In the sapphire substrate processing, the first step is to remove the sapphire crystal rod with a diamond trepanning drill. The main process of sapphire cutting is to cut sapphire crystal by the diamond cutting edge at the top of the trepanning drill. The chip generated is discharged continuously through the chip removal channel of the trepanning drill, and finally, the crystal rod with the required size is obtained.

Due to the brittleness of sapphire, the precision of the diamond bit is very high in the nesting process. Generally, there are 2-inch (refers to the inner diameter of φ54mm, the same below), 4-inch (φ103mm), 6-inch (φ154mm) and 8-inch (φ204mm) bits corresponding to 2-inch, 4-inch, 6-inch and 8-inch of the substrate. At present, 2-inch trepanning drills have basically been domesticated, while 4-inch and more than 6-inch diamond trepanning drills still need to be imported.

Diamond casing drill belongs to a kind of thin-walled drill. One of the technical difficulties is how to control the bit accuracy, including the drill pipe accuracy, cutter head accuracy, welding accuracy and subsequent processing accuracy. The jitter exceeding the accuracy requirements will cause cracks in the crystal bar and affect the subsequent production. Moreover, with the development of sapphire substrates in the direction of the thinner and larger direction, the requirements of diamond trepanning drill are higher and higher.

Therefore, the development of a high-precision diamond bit is an urgent problem to be solved in the LED industry.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows and so on. Want to know about sapphire optics? Please contact us.

THE INTRODUCTION OF SAPPHIRE(2021年04月29日)

cryscore — 2021-04-21T17:08:55+0900

https://www.cryscore.com/products/patterned-sapphire-substrates/

Sapphire single crystal, is pure aluminum oxide (α-Al2O3). It has excellent thermal conductivity, electrical insulation, light transmittance, chemical stability, high-temperature resistance, high strength, high hardness and a series of excellent characteristics. It is a window material for infrared devices, missiles, submarines, satellite space technology, detection and high-power laser, high-quality optical materials, wear-resistant bearing materials and substrate materials.

The lattice constant mismatch between C-plane of sapphire and GaN single crystal film is small, and it also meets the requirements of high-temperature resistance in the growth process of GaN single crystal film, which makes sapphire chip become the key substrate material for white/blue LED, and is widely used in LED industry. Because the temperature distribution of sapphire single crystal grown by heat exchange method (HEM) is contrary to the gravity field, there is no convection in the melt, which ensures the crystal growth in a stable state. The sapphire single crystal has perfect optical uniformity and has no defects such as scattering, inclusion and bubble. Therefore, sapphire substrates are good substrate materials.

At present, the quality of the sapphire crystal grown by the heat exchange method is the best among all sapphire crystal growth methods. According to French Yole statistics, sapphire substrate materials account for about 75%, and semiconductor lighting (LED) substrate materials account for more than 95%. The acquisition of a high-performance chip is largely dependent on the surface processing quality of the sapphire substrate. Sapphire has high hardness and high chemical stability, which belongs to hard brittle and difficult to process materials. The process mainly involves high-precision equipment, high-performance diamond tool consumables and matching processing technology.

CRYSCORE cooperates with universities and scientific research institutions to provide a variety of applied materials, unique processing equipment, and process solutions to help the progress of various scientific research projects and production projects. We aim to be one of the most famous sapphire substrate manufacturers in the world.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows and so on. Want to know about sapphire optics? Please contact us.

SAPPHIRE SUBSTRATE PROCESSING FLOW(2021年04月28日)

cryscore — 2021-04-21T17:08:27+0900

https://www.cryscore.com/led-substrates.html

1. Growing: The single sapphire crystal with large size and high quality is grown in the crystal growth furnace.
2. Orientation: Ensure the sapphire crystal in the correct position on the cutting machine, so as to facilitate the cut processing;
3. Take out the rod: Take out the sapphire rod from the sapphire crystal in a specific way (including head and tail removal and end face grinding);
4. Rolling grinding: The cylindrical grinding of the crystal rod is carried out with an external grinder to obtain the accurate cylindrical dimension accuracy (rolling, grinding of the surface);
5. Quality inspection: To ensure that the quality of the sapphire rod and the size and orientation of the inserted sapphire rod meet the customer's specifications;
6. Orientation: Accurately locate the position of sapphire crystal rod on the slicing machine, so as to facilitate the precise slicing process;
7. Slicing: Use diamond wire saw to cut the sapphire crystal rod into thin wafers;
8. Grinding: Remove the chip cutting damage layer caused by slicing and improve the flatness of the wafer;
9. Chamfer: Trim the edge of the wafer into a circular arc to improve the mechanical strength of the edge of the wafer and avoid defects caused by stress concentration, with a 45-degree chamfer of 0-0.2 mm;
10. Polishing: Improve the surface roughness of the wafer to reach the epitaxial wafer-level precision (first double-sided polishing, then single-sided polishing). The front surface roughness is less than 0.3μm, and the back surface roughness is 0.4-1.0 μm;
11. Cleaning: Remove the pollutants on the wafer surface, such as dust particles, metal, organic dirt, etc.;
12. Quality inspection: The wafer (flatness, surface dust particles, etc.) should be inspected with a high-precision detector to meet the requirements of customers.

Excellent quality and stable supply capabilities can make sapphire substrate suppliers highly recognized and trusted by customers. CRYSCORE purchases high-precision imported equipment and has a strong large-scale production capacity of various types of high-quality sapphire substrates, leave us a message to get a quote.

CRYSCORE is specialized in led sapphire wafer, our experts provide professional solutions for customers around the world.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows, sapphire rod and so on. Want to know about sapphire optics? Please contact us.

PROCESSING TECHNOLOGY OF LED PATTERNED SAPPHIRE SUBSTRATE(2021年04月27日)

cryscore — 2021-04-21T17:07:45+0900

https://www.cryscore.com/

For patterned sapphire substrate, before it becomes a qualified substrate, it has gone through several processes, such as cutting, rough grinding, fine grinding and polishing. Take 2-inch sapphire as an example:

1. Cutting: Cutting is made from sapphire crystal rod with a wire cutting machine, and the thickness is about 500um. In this process, the diamond wire saw is the most important consumables, which are mainly from Japan, South Korea and Taiwan.

2. Rough polishing: The surface of sapphire is very rough after cutting, which is needed to repair deep scratch and improve the overall flatness. In this step, B4C (50 ~ 80um) and coolant is used for grinding. After grinding, the surface roughness Ra is about 1um.

3. Finish polishing: The next step is fine processing, because it is directly related to the yield and quality of the final product. At present, the thickness of the standardized 2-inch patterned sapphire substrates is 430um, so the total removal amount of fine polishing is about 30um. Considering the removal rate and the final surface roughness Ra, polycrystalline diamond solution and resin tin plate are used to process in lapping mode.

4. Polishing: Although the scratch caused by polycrystalline diamond is obviously smaller than that of a single-crystal diamond, it will still leave obvious scratches on the surface of sapphire. Therefore, it will be polished by CMP to remove all scratches and leave a perfect surface. The CMP technology was originally used to flatten silicon substrate, but now it is also applicable to patterned sapphire substrate. After the CMP polishing process of the sapphire substrate after layer testing, qualified products can be handed over to the epitaxial factory for epitaxy.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows and so on. Want to know about sapphire optics? Please contact us.

TYPES OF PATTERNED SAPPHIRE SUBSTRATE APPLICATIONS(2021年04月26日)

cryscore — 2021-04-21T17:07:10+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

The patterned sapphire substrate used by many epitaxial manufacturers can be divided into three types:

1: C-Plane patterned sapphire substrate
This is a sapphire substrate surface for GaN growth widely used by manufacturers, mainly because sapphire crystal growth along the C axis has a mature process, relatively low cost, and stable physical and chemical performance, and the technology of epitlite on C-plane is mature and stable.

2: R-plane or M-plane patterned sapphire substrate
R-plane or m-plane sapphire substrate is mainly used to grow non-polar/semi-polarity surface GaN epitaxial film, in order to improve the luminous efficiency. Usually, GaN epitaxial film in the patterned sapphire substrates preparation was grown along the C axis, and the C axis is the polar axis, which leads to a strong built-in electric field in the active layer quantum wells of GaN-based devices, which will reduce the luminous efficiency. The non-polar GaN epitaxy is developed to overcome this physical phenomenon and improve the luminous efficiency.

3. Patterned Sapphire Substrate (PSS)
In the way of Growth or Etching, nanoscale specific microstructural patterns are designed and made on sapphire substrate so as to control the light output form of LED; besides, the differential defects between GaN growing on sapphire substrate can be reduced, the quality of epitlite can be improved, and the internal quantum efficiency of LED and the optical extraction efficiency can be enhanced.

Among all the sapphire substrate suppliers, CRYSCORE is definitely the one you can trust, call us at +86-391-3933 936 now!

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows and so on. Want to know about sapphire optics? Please contact us.

THE APPLICATION RANGE OF SAPPHIRE(2021年04月25日)

cryscore — 2021-04-21T17:06:36+0900

https://www.cryscore.com/led-substrates.html

In the past decades, with the rapid development of military optoelectronic/infrared systems, people have put forward higher requirements for large area optical windows, and the demand for optical materials with high hardness, high strength and high transmittance is becoming more and more intense. Sapphire material has a high Mohs hardness of 9.0 and high transmittance in both visible and infrared bands, so it has become the preferred material in the extreme use environment.
As an important technical crystal, sapphire can be widely used in military, aviation, electronic consumer products and other fields. Sapphire application has broad prospects, especially in the field of electronic consumption and LED basic applications.

With the continuous improvement of sapphire production technology and the continuous reduction of production cost, in addition to the previous application of LED basic panel, sapphire has been widely concerned by various industries in recent years, and all countries in the world are optimistic about the business opportunities of sapphire substrate.

Patterned sapphire substrates are mainly used in the production of led sapphire wafer materials, with high hardness, high dielectric coefficient, high thermal conductivity and other advantages. In addition to smartphones and wearable devices, it also includes camera lens protection cover and main screen key of apple, Samsung, LG and other high-end smartphones. Patterned sapphire substrates are expected to be applied in optics, aerospace science and technology, military and other fields.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows, sapphire ingot and so on. Want to know about optical sapphire? Please contact us.

DEVELOPMENT OF PATTERNED SAPPHIRE SUBSTRATES(2021年04月24日)

cryscore — 2021-04-21T17:06:01+0900

https://www.cryscore.com/

The composition of sapphire is aluminum oxide. Sapphire has been used as a substrate material to form semiconductor devices since the 1960s. Because sapphire has high strength, high hardness, high wear resistance, high heat resistance, high wear resistance and high chemical resistance, even if the substrate body is reused, it will not cause degradation and damage. It can increase recycling frequency, reduce manufacturing costs and save resources, so it is very suitable to replace other expensive substrate materials. At present, the quality of the mainstream ultra-high brightness LED in the market depends on the quality of gallium nitride crystal layer, and the quality of gallium nitride crystal layer is closely related to the quality of led sapphire substrate used, which is also the reason why R&D personnel pays attention to the R&D and patent layout in the field of sapphire substrate.

Because sapphire has the above excellent characteristics, its substrate can be used repeatedly as the main substrate, so it can be used as the sacrificial substrate for LED. As a sacrificial substrate, the related patent applications mainly involve the improvement of the structure and material of the separation layer. The formation of the separation layer and semiconductor film on sapphire substrate to form semiconductor devices can reduce the process difficulty and cost.

In addition, in order to provide better raw sapphire crystal materials, the inventors also focus on the research and development of raw material processing technology and cutting technology and patent layout. For example, relevant patents improve the processing technology to manufacture larger patterned sapphire substrates, using diamond wire technology for cutting, so as to facilitate large-scale manufacturing and production of the sapphire substrate.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows and so on. Want to know about optical sapphire? Please contact us.

PATTERNED SAPPHIRE SUBSTRATE(2021年04月23日)

cryscore — 2021-04-21T17:05:35+0900

https://www.cryscore.com/led-substrates.html

PSS, namely Patterned Sapphire Substrate, refers to the preparation of periodic patterned structure on Sapphire Substrate, which is a technology developed in recent years to effectively improve the light output efficiency of LED chips. The patterned interface changes the growth process of GaN, which can reduce the dislocation defects of the GaN epitaxy and improve quantum efficiency. In addition, the rough GaN/sapphire interface can scatter the photons emitted from the source area, so that the originally fully reflected photons have the opportunity to be emitted out of the device, to effectively improving the light-extraction efficiency. Therefore, LED using PSS technology can greatly improve the luminous intensity and luminous efficiency compared with ordinary LED, also the reverse leakage current can be reduced and the life of LED devices can be extended.

Sapphire substrate can be divided into the micron-scale sapphire substrate and the nanoscale sapphire substrate according to the lattice constant. The nanoscale sapphire substrate has band-gap effects on photonic crystals that are not present in micron-scale substrates. The banding effect peculiar to the photonic crystal can be used to control the photons so that more photons can be emitted to the outside of the LED without being absorbed by the substrate. It proves that the performance of LED can be improved by using a nanoscale patterned sapphire substrate than a micro-scale one.

The main preparation technology of PSS includes wet etching and dry etching.
Wet etching:
1. Depositing SiO2 on the sapphire substrate using the plasma-enhanced chemical vapor deposition (PECVD) or daub photo-resist mask.
2. Transfer the pattern to the mask using lithography.
3. Using mixed acid solution (H3PO4 and H2SO) for corrosion, under the protection of mask.
4. After removing the mask on the surface, we can get the PSS.

Dry etching:
1. Depositing SiO2 on the sapphire substrate using the plasma-enhanced chemical vapor deposition (PECVD) or daub photo-resist mask.
2. Make Lithographic pattern on the mask by using the Lithography technique:
Firstly, the etched gas will be glow-discharge and generate active particles by inductive coupling, which interact with the solid surface of the substrate.
3. After removing the mask on the surface, we can get the PSS.

LED sapphire substrate is very important, if you are looking for related products, contact us to get a quote.

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows, Al2O3 substrate and so on. Want to know about optical sapphire? Please contact us.

EPITAXIAL TECHNIQUE AND EQUIPMENT FOR WAFER(2021年04月22日)

cryscore — 2021-04-21T17:05:06+0900

https://www.cryscore.com/products/sapphire-wafers-sapphire-substrates/

Sapphire wafer is widely used as a substrate in epitaxy.

Here is the epitaxial technique and equipment used during that process:
MOCVD: Metal-Organic Chemical Vapor Deposition
APCVD: Atmospheric Pressure Chemical Vapor Deposition
RPCVD: Reduced Pressure Chemical Vapor Deposition
LPCVD: Low-Pressure Chemical Vapor Deposition
UHCVD: Ultra-high vacuum Chemical Vapor Deposition
LCVD: Laser-induced Chemical Vapor Deposition
PECVD / PACVD: Plasma Enhanced (Assisted) Chemical Vapor Deposition
RF-MBE: Radio Frequency-Molecular Beam Epitaxy
PA-MBE: Plasma Assisted-Molecular Beam Epitaxy
HVPE: Hydride Vapor Phase Epitaxy
VPE: Vapor Phase Epitaxy
LPE: Liquid Phase Epitaxy
SPE: Solid Phase Epitaxy
CME: Chemical beam epitaxy
ALD / ALE: Atomic Layer Deposition /Atomic Layer Epitaxy
IBAD: Iron Beam Assisted Deposition
PLD: Pulsed Laser Deposition
RF magnetron sputtering
Arc plasma coating
EBE: Electron Beam Evaporation

MBE:
1. Physical deposition process
2. The ultrahigh vacuum coating technique
3. Atomic layer precision thickness control, suitable for ultra-thin superlattice materials
4. Growth of high purity epitaxial layers with high uniformity
MOCVD:
1. Wide range of application: the growth of almost all compounds and alloy semiconductors
2. Precise control of crystal growth; Good repeatability; suitable for industrial production
HVPE:
1. Growth of II-V Nitride compound semiconductor thin film, superlattice materials.
2. Disadvantage: High deposition rate, poor lattice quality
PECVD:
1. Low temperature: save the cost, increase production capacity
2. Fast deposition speed
3. Good lattice quality
4. Disadvantage: High cost (expensive equipment), strict requirements on gas purity

CRYSCORE is a professional sapphire wafer supplier, contact us to get more info.

EPITAXIAL THIN FILM ON SAPPHIRE(2021年04月21日)

cryscore — 2021-04-21T17:04:30+0900

https://www.cryscore.com/products/standard-sapphire-wafers/

More and more materials are synthesized by means of deposition or epitaxy on the sapphire substrate.
Here we list some epitaxial layer (thin film) on sapphire for your reference:

GaN: LED application
SOS: Silicon on sapphire, semiconductor integrated circuit application
BN: h-BN insulator, buffer layer for graphene fabrication
ZnO: II-VI semiconductor, fabrication of surface acoustic wave device
AlN: on the patterned sapphire substrate, buffer layer for graphene fabrication or others
InN: by RF-MBE to get monocrystal InN on C-plane sapphire wafer, by MOCVD to get InN nanorod on R-plane sapphire
Al, Ga, In, N alloy: such as AlGaN, GaInN, InAlGaN, AlGaInN…
WSe2: TMDCs (Transition Metal Dichalcogenides), by CVD (Chemical vapor deposition) on C-plane sapphire
MoS2: TMDCs (Transition Metal Dichalcogenides), by CVD (Chemical vapor deposition) on C-plane sapphire
SiC: by LP-CVD (low-pressure chemical vapor deposition), on C-plane sapphire without AlN buffer layer
SnO: by PLD (pulsed laser deposition), on R-plane (1-102) sapphire
SnO2: wide bandgap, Ultraviolet material
ZnS: hexagonal lead-zinc structure
MgO: as a buffer material to induce polyoxide functional film
MgZnO: on M-plane(10-10) sapphire, the bang-gap alloy semiconductor film
BiFeO3: on GaN / C-plane sapphire
VO2: by PLD, on C-plane sapphire
MgB2: superconducting thin film
SiO2: by PECVD
ITO: conductive material
CeO2: buffer layer for superconducting thin film YBa2Cu3O7-δ(YBCO) fabrication
β-Ga2O3: on GaN / C-plane sapphire
In2O3: MOCVD, On C-plane sapphire
NiO: transition metal oxide film
TiO2: wide-bandgap oxide semiconductor material, photovoltaic material, Transparent Conductive Film
YSZ: Yttria-stabilized zirconia, PLD, YSZ / TiO2 / C-plane (0001) or A-plane (11-20) sapphire
LiNbO3: solar cell application
CZTS: epitaxy on sapphire or ZnS, Solar cell application
CdTe: II-VI compound semiconductor, solar cell application

CRYSCORE OPTOELECTRONIC LIMITED is a professional sapphire wafers manufacturer. We provide Sapphire Wafers, Sapphire Windows, Sapphire wafer and so on. Want to know about optical sapphire? Please contact us.